AZ ELECTRONIC MATERIALS USA CORP.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1490
 
  
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 1234
 
  
 
C08F MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 6119
 
  
 
C08G MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 6114
 
  
 
C02F TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE 352
 
  
 
C08L COMPOSITIONS OF MACROMOLECULAR COMPOUNDS 3113
 
  
 
B01D SEPARATION 2132
 
  
 
C08J WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER- TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C C08F, C08G or C08H 276
 
  
 
B01J CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS 1108
 
  
 
C04B LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS 167

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8470924 Color-pigmented paint composition having high covering powder, increased scratch resistance, and easy-to clean propertiesMay 15, 08Jun 25, 13[C08L]
7605682 Magnetic core type laminated inductorJan 24, 06Oct 20, 09[H01F]
7169531 Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivativesOct 28, 04Jan 30, 07[G03F]
6043002 Metal ion reduction in novolak resin solution using an anion exchange resinJul 29, 97Mar 28, 00[G03F]
5843319 Positive-working radiation-sensitive mixtureJul 29, 97Dec 01, 98[B01J, C02F, B01D]
5686561 Metal ion reduction in novolak resin solution using an anion exchange resinAug 23, 94Nov 11, 97[C08J, C08G, C08F]
5646218 Novolak resin blends for photoresist applicationsAug 05, 96Jul 08, 97[C08G, C08F, C08L]
5624789 Metal ion reduction in top anti-reflective coatings for photoresisisJun 02, 95Apr 29, 97[G03C, G03F, C02F]
5594098 Metal ion reduction in novolak resins and photoresistsJul 11, 94Jan 14, 97[C08F, G03C]
5580700 Metal ion reduction in bottom anti-reflective coatings for use in semiconductor device formationJun 02, 95Dec 03, 96[G03C]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0327,867 COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING METHOD USING SAMEAbandonedJul 21, 16Nov 10, 16[G03F]
2014/0193,753 COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATINGAbandonedFeb 19, 14Jul 10, 14[G03C, G03F]
2014/0127,630 SILICON OXYNITRIDE FILM FORMATION METHOD AND SUBSTRATE EQUIPPED WITH SILICON OXYNITRIDE FILM FORMED THEREBYAbandonedJun 22, 11May 08, 14[C01B, G02B]
8524441 Silicon-based antireflective coating compositionsExpiredFeb 25, 08Sep 03, 13[C09D]
2013/0108,956 NANOCOMPOSITE POSITIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOFAbandonedNov 01, 11May 02, 13[B82Y, G03F]
2013/0105,440 NANOCOMPOSITE NEGATIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOFAbandonedNov 01, 11May 02, 13[B82Y, C23F, G03F]
2012/0251,943 ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOFAbandonedMar 30, 11Oct 04, 12[C09K, G03F]
2012/0122,029 Underlayer Developable Coating Compositions and Processes ThereofAbandonedNov 11, 10May 17, 12[G03F]
2012/0108,067 Edge Bead Remover For CoatingsAbandonedOct 29, 10May 03, 12[H01L, G03F]
2011/0250,544 BOTTOM ANTIREFLECTIVE COATING COMPOSITIONSAbandonedJun 16, 11Oct 13, 11[C07D, C09D, G03F]
2011/0086,312 Positive-Working Photoimageable Bottom Antireflective CoatingAbandonedOct 09, 09Apr 14, 11[G03F]
2011/0014,796 DIPPING SOLUTION FOR USE IN PRODUCTION OF SILICEOUS FILM AND PROCESS FOR PRODUCING SILICEOUS FILM USING THE DIPPING SOLUTIONAbandonedMar 03, 09Jan 20, 11[H01L, H01B]
2010/0316,949 Spin On Organic Antireflective Coating Composition Comprising Polymer with Fused Aromatic RingsAbandonedJun 10, 09Dec 16, 10[C08G, B29C, G03F]
7838653 Regulatory elements associated with CBF transcription factor of ryeExpiredOct 23, 08Nov 23, 10[C07H, C12N, A01H]
7816071 Process of imaging a photoresist with multiple antireflective coatingsExpiredJan 24, 06Oct 19, 10[G03F]
7754414 Antireflective coating compositionsExpiredJul 12, 06Jul 13, 10[G03C, G03F]
2010/0136,477 Photosensitive CompositionAbandonedDec 01, 08Jun 03, 10[G03F]
2010/0119,979 Antireflective Coating Composition Comprising Fused Aromatic RingsAbandonedNov 13, 08May 13, 10[C08G, G03F, C08L]
2010/0119,980 Antireflective Coating Composition Comprising Fused Aromatic RingsAbandonedNov 13, 08May 13, 10[C08G, G03F, C08L]
7704670 High silicon-content thin film thermosetsExpiredJun 22, 06Apr 27, 10[G03F]

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